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Low temperature deposition of 2D WS2 layers from WF6 and H2S…
Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
Article, Chapter
Authors: A. Delabie
Publication: Chemical Communications, Volume:51, Issue:86, Page(s):15692-15695
Published: 2015-10-15
ISSN: 1359-7345
DOI: 10.1039/C5CC05272F
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View Full Text Source:Chemical Communications,Chemical Communications,RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Journal:  Chemical Communications Source:RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Collection:  RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Coverage:
  • 2008~present; ;issue:1~present
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