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Near room temperature plasma enhanced atomic layer depositio…
Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
Article, Chapter
Authors: Matthias M. Minjauw
Publication: Journal of Materials Chemistry C, Volume:3, Issue:19, Page(s):4848-4851
Published: 2015-05-07
ISSN: 2050-7526
DOI: 10.1039/C5TC00751H
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View Full Text Source:Journal of Materials Chemistry C,Journal of Materials Chemistry C,RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Journal:  Journal of Materials Chemistry C Source:RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Collection:  RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Coverage:
  • 2013~present; ;issue:1~present
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