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Article:   SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

Journal:   Journal of Micromechanics and Microengineering   [0960-1317]

Author:   del Campo, A
Year:  2007     Volume:  17     Issue:  6     Pages:  R81 - R95

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Institute of Physics Historic Archive Recent Purchase
From 1991  until  2015
Institute of Physics IOPscience extra
From 1991/03/01, volume 1: issue 1

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Institute of Physics IOPscience extra
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