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Issue 39, 2013
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Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

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Abstract

The atmospheric pressure chemical vapor deposition (APCVD) of SiO2–TiO2 thin films on glass by employing a [[(tBuO)3SiO]2–Ti(OiPr)2] single-source precursor, which can be prepared from commercially available materials, results in antireflective thin films with high silica SiO2 : TiO2 ratio (i.e. SiO2 > 1) on float glass under industrially relevant manufacturing conditions.

Graphical abstract: Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

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Publication details

The article was received on 26 Jul 2013, accepted on 29 Aug 2013, published on 30 Aug 2013 and first published online on 30 Aug 2013


Article type: Communication
DOI: 10.1039/C3TC31465K
Citation: J. Mater. Chem. C, 2013,1, 6188-6190
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    Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

    E. R. Klobukowski, W. E. Tenhaeff, J. W. McCamy, C. S. Harris and C. K. Narula, J. Mater. Chem. C, 2013, 1, 6188
    DOI: 10.1039/C3TC31465K

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