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Materials for optical, magnetic and electronic devices
Impact Factor 4.696 48 Issues per Year

Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

Corresponding authors
Materials Science & Technology Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, USA
Solar Performance Group, PPG Industries, Cheswick, USA
J. Mater. Chem. C, 2013,1, 6188-6190

DOI: 10.1039/C3TC31465K
Received 26 Jul 2013, Accepted 29 Aug 2013
First published online 30 Aug 2013
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Journal of Materials Chemistry C - Information Point

Supplementary Info