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Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

Corresponding authors
Materials Science & Technology Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, USA
Solar Performance Group, PPG Industries, Cheswick, USA
J. Mater. Chem. C, 2013,1, 6188-6190

DOI: 10.1039/C3TC31465K
Received 26 Jul 2013, Accepted 29 Aug 2013
First published online 30 Aug 2013
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Journal of Materials Chemistry C - Information Point

Supplementary Info