Materials for optical, magnetic and electronic devices
48 Issues per Year
Communication

Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

Show Affiliations
Hide Affiliations
*
Corresponding authors
a
Materials Science & Technology Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, USA
E-mail: narulck@ornl.gov
b
Solar Performance Group, PPG Industries, Cheswick, USA
J. Mater. Chem. C, 2013,1, 6188-6190

DOI: 10.1039/C3TC31465K
Received 26 Jul 2013, Accepted 29 Aug 2013
First published online 30 Aug 2013
| | | | | | More
Please wait while Download options loads
Download Citation
 
 
Icon Journal of Materials Chemistry C - Information Point

Supplementary Info