Issue 24, 2018

Prediction of two-dimensional nodal-line semimetals in a carbon nitride covalent network

Abstract

Carbon nitride covalent compounds have emerged as a prominent member of 2D materials beyond graphene. The experimental realizations of 2D graphitic carbon nitride g-C3N4, nitrogenated holey graphene C2N, and polyaniline C3N have shown their promising potential in energy and environmental applications. In this work, we predict a new type of carbon nitride network with a C9N4 stoichiometry from first principles calculations. Unlike common C–N compounds and covalent organic frameworks (COFs), which are typically insulating, surprisingly C9N4 is found to be a 2D nodal-line semimetal. The nodal line in C9N4 forms a closed ring centered at the Γ point, which originates from the pz orbitals of both C and N. The linear crossing occurs right at the Fermi level contributed by two sets of dispersive Kagome and Dirac bands, which is robust due to negligible spin–orbit coupling in C and N. Furthermore, it is revealed that the degeneracy along the high-symmetry path is protected by out-of-plane mirror or C2 rotational symmetry, rather than in-plane mirror symmetry. The chemical potential difference between C and N, as validated by using a single orbital tight-binding model, plays a significant role in forming the nodal ring. Interestingly, a new structure of the nodal line, i.e., a nodal cylinder, is found in momentum space for AA-stacked C9N4. Our results indicate possible functionalization for a novel metal-free C–N covalent network with interesting semimetallic properties.

Graphical abstract: Prediction of two-dimensional nodal-line semimetals in a carbon nitride covalent network

Supplementary files

Article information

Article type
Paper
Submitted
19 Mar 2018
Accepted
30 Apr 2018
First published
02 May 2018

J. Mater. Chem. A, 2018,6, 11252-11259

Author version available

Prediction of two-dimensional nodal-line semimetals in a carbon nitride covalent network

H. Chen, S. Zhang, W. Jiang, C. Zhang, H. Guo, Z. Liu, Z. Wang, F. Liu and X. Niu, J. Mater. Chem. A, 2018, 6, 11252 DOI: 10.1039/C8TA02555J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements