Issue 22, 2017

Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

Abstract

Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.

Graphical abstract: Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

Supplementary files

Article information

Article type
Communication
Submitted
06 Mar 2017
Accepted
10 May 2017
First published
10 May 2017
This article is Open Access
Creative Commons BY license

J. Mater. Chem. A, 2017,5, 10836-10842

Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

M. Quesada-González, K. Baba, C. Sotelo-Vázquez, P. Choquet, C. J. Carmalt, I. P. Parkin and N. D. Boscher, J. Mater. Chem. A, 2017, 5, 10836 DOI: 10.1039/C7TA02029E

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