Issue 16, 2014

A simple and scalable approach towards the preparation of superhydrophobic surfaces – importance of the surface roughness skewness

Abstract

A simple and easily up-scalable approach towards the preparation of fluorine-free superhydrophobic surfaces is proposed. Surfaces with water contact angle (WCA) as high as 170° and contact angle hysteresis (CAH) down to 5° are obtained on industrial metallic foils (cold-rolled aluminium foils and electrodeposited copper foils) coated thanks to an atmospheric pressure plasma-enhanced chemical vapour deposition method. Nano- and micro-scale roughness characterisation of the surface, performed by atomic force microscopy (AFM) and confocal microscopy, provided evidence for the substrate surface skewness as the major parameter influencing the WCA for identical nano-rough plasma-polymerised PDMS coatings. A symmetric height distribution, Rskm = 0, is shown to be more desirable to achieve superhydrophobic surfaces.

Graphical abstract: A simple and scalable approach towards the preparation of superhydrophobic surfaces – importance of the surface roughness skewness

Supplementary files

Article information

Article type
Paper
Submitted
21 Jan 2014
Accepted
30 Jan 2014
First published
30 Jan 2014

J. Mater. Chem. A, 2014,2, 5744-5750

A simple and scalable approach towards the preparation of superhydrophobic surfaces – importance of the surface roughness skewness

N. D. Boscher, V. Vaché, P. Carminati, P. Grysan and P. Choquet, J. Mater. Chem. A, 2014, 2, 5744 DOI: 10.1039/C4TA00366G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements