Issue 4, 2013

oCVD poly(3,4-ethylenedioxythiophene) conductivity and lifetime enhancement via acid rinse dopant exchange

Abstract

Reduced sheet resistance and longer film stability of oCVD (oxidative chemical vapour deposition) PEDOT films were achieved by including a post-process acid rinse step in the production of the thin films. PEDOT films were rinsed in multiple concentrations of hydrobromic acid, sulfuric acid, and hydrochloric acid to test the effect of acid rinsing on sheet resistance, doping concentration, chemical composition, optical transmittance, and film morphology. XPS, FTIR, Raman spectroscopy, and XRD measurements were taken to determine the morphology and composition of the rinsed films. On average, rinsing films in HCl, HBr, and H2SO4 produced conductivity increases of 37%, 135%, and 117%. The dc to optical conductivity ratio, σdc/σop, was increased to 6, 12, and 10, for HCl, HBr, and H2SO4 rinsed films respectively as compared to σdc/σop = 4 for MeOH rinsed films. This study found evidence of dopant exchange within the films facilitated by the acid rinsing step, as well as complete removal of residual iron chloride oxidant. The acid rinse step also resulted in improved film conductivity stability at elevated temperatures. The XRD measurements in particular show signs of semi crystallinity in the PEDOT film after acid rinsing in comparison to an amorphous structure observed before this step. In this study, acid rinsing applied as a post-process step alters thin PEDOT films in ways that enhance their ability to function as electrode materials in photovoltaic devices.

Graphical abstract: oCVD poly(3,4-ethylenedioxythiophene) conductivity and lifetime enhancement via acid rinse dopant exchange

Supplementary files

Article information

Article type
Paper
Submitted
14 Sep 2012
Accepted
20 Nov 2012
First published
21 Nov 2012

J. Mater. Chem. A, 2013,1, 1334-1340

oCVD poly(3,4-ethylenedioxythiophene) conductivity and lifetime enhancement via acid rinse dopant exchange

R. M. Howden, E. D. McVay and K. K. Gleason, J. Mater. Chem. A, 2013, 1, 1334 DOI: 10.1039/C2TA00321J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements