Issue 18, 2017, Issue in Progress

Tuning plasmonic properties of CuS thin films via valence band filling

Abstract

In this study, we propose an interesting strategy for tuning the localized surface plasmon resonance (LSPR) of CuS thin films by filling the vacancies in the valence band by electrochemical reduction under acidic conditions leading to the decrease in free carrier concentration yielding CuS thin films with different LSPR properties.

Graphical abstract: Tuning plasmonic properties of CuS thin films via valence band filling

Article information

Article type
Paper
Submitted
21 Nov 2016
Accepted
07 Feb 2017
First published
13 Feb 2017
This article is Open Access
Creative Commons BY license

RSC Adv., 2017,7, 11118-11122

Tuning plasmonic properties of CuS thin films via valence band filling

S. S. Kalanur and H. Seo, RSC Adv., 2017, 7, 11118 DOI: 10.1039/C6RA27076J

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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