Issue 49, 2015

Synthesis of poly(dimethylsiloxane)-block-poly[3-(triisopropyloxysilyl) propyl methacrylate] and its use in the facile coating of hydrophilically patterned superhydrophobic fabrics

Abstract

We report the synthesis and applications of a novel poly(dimethylsiloxane-block-poly[3-(triisopropyloxysilyl)propyl methacrylate]) (PDMS-b-PIPSMA) diblock copolymer. PDMS-b-PIPSMA was synthesized via atom transfer radical polymerization (ATRP), and was characterized by 1H NMR and SEC analysis. This block copolymer was successfully grafted onto cotton fabrics via sol–gel chemistry using the PIPSMA block as an anchor to generate superhydrophobic fabrics. These superhydrophobic cotton fabric coatings were tested as membranes for oil–water separation, where water was retained on the surface of the hydrophobic cotton, while organic solvents permeated through this coated fabric. In addition, the batik technique was used to prepare superhydrophobic cotton fabrics that bore hydrophilic patterns. We demonstrated that water-based ink solutions readily wet the hydrophilic regions, but they were repelled by the superhydrophobic regions. These patterned fabrics may thus find applications as stamps for the imprinting of aqueous ink solution-based patterns onto other fabrics.

Graphical abstract: Synthesis of poly(dimethylsiloxane)-block-poly[3-(triisopropyloxysilyl) propyl methacrylate] and its use in the facile coating of hydrophilically patterned superhydrophobic fabrics

Supplementary files

Article information

Article type
Paper
Submitted
02 Feb 2015
Accepted
21 Apr 2015
First published
21 Apr 2015

RSC Adv., 2015,5, 39505-39511

Author version available

Synthesis of poly(dimethylsiloxane)-block-poly[3-(triisopropyloxysilyl) propyl methacrylate] and its use in the facile coating of hydrophilically patterned superhydrophobic fabrics

M. Rabnawaz, Z. Wang, Y. Wang, I. Wyman, H. Hu and G. Liu, RSC Adv., 2015, 5, 39505 DOI: 10.1039/C5RA02067K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements