Issue 17, 2014

Butyl lithium assisted direct grafting of polyoligomeric silsesquioxane onto graphene

Abstract

Polyoligomeric silsesquioxane (POSS) decorated graphene nanoplatelets were synthesized using n-butyl lithium (n-BuLi). The isolated topological defects present along the edges of graphite played a crucial role in the grafting process. n-BuLi specifically scavenged the protons from these defect sites. These reactive anionic centres generated in situ, react with the POSS. Various microscopic characterization techniques indicated functionalization of the edges of graphene nanoplatelets. Further, highly exfoliated graphene layers were observed after modification. The present functionalization technique avoids the use of harsh oxidation techniques of graphite, which are commonly used for secondary modification of graphene.

Graphical abstract: Butyl lithium assisted direct grafting of polyoligomeric silsesquioxane onto graphene

Supplementary files

Article information

Article type
Paper
Submitted
19 Oct 2013
Accepted
12 Dec 2013
First published
20 Dec 2013

RSC Adv., 2014,4, 8649-8656

Butyl lithium assisted direct grafting of polyoligomeric silsesquioxane onto graphene

T. Mondal, A. K. Bhowmick and R. Krishnamoorti, RSC Adv., 2014, 4, 8649 DOI: 10.1039/C3RA47373B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements