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Issue 32, 2013
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Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

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Abstract

Novel ultrathin TiO2–Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2–Cu-ions (M+) with the polyester surface due to the high fraction and density of M+-ions interacting with the biased substrate.

Graphical abstract: Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

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Publication details

The article was received on 28 Mar 2013, accepted on 10 Jun 2013 and first published on 11 Jun 2013


Article type: Communication
DOI: 10.1039/C3RA41528G
Citation: RSC Adv., 2013,3, 13127-13130
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    Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

    S. Rtimi, C. Pulgarin, O. Baghriche and J. Kiwi, RSC Adv., 2013, 3, 13127
    DOI: 10.1039/C3RA41528G

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