Issue 29, 2013

Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography

Abstract

This article demonstrates, through finite element analysis, the possibility to manufacture sub-30 nm polymeric channels using electrostatic induced lithography. Channels with a width of 25 nm, a depth of 50 nm and an inter-channel wall of 28 nm can be obtained by this patterning process. The influence of operational parameters such as the filling factor, the aspect ratio of the master electrode, the applied voltage and the gap between the two electrodes and initial film thickness has been studied in detail to define the fabrication limits of this process in the case of periodic nanostructures. Conclusions for such nanostructures can be generalised to other shapes manufactured from polymers.

Graphical abstract: Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography

Article information

Article type
Paper
Submitted
14 Jan 2013
Accepted
26 Apr 2013
First published
30 Apr 2013

RSC Adv., 2013,3, 11839-11845

Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography

H. Li, W. Yu, L. Zhang, Z. Liu, K. E. Brown, E. Abraham, S. Cargill, C. Tonry, M. K. Patel, C. Bailey and M. P. Y. Desmulliez, RSC Adv., 2013, 3, 11839 DOI: 10.1039/C3RA40188J

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