Issue 24, 2017

MoS2 heterostructure with tunable phase stability: strain induced interlayer covalent bond formation

Abstract

The structural phase transition in MoS2 promises applications in novel nanoelectronic devices. Elastic strain engineering can not only serve as a potential route for phase transition engineering, but also reveal potential ferroelastic behavior of MoS2 nanostructures. However, the elastic strain required for phase transition in monolayer MoS2 is far beyond its elastic limit, thus inhibiting the experimental realization. In this study, employing density functional theory calculations, we uncover that by forming heterostructure with buckled 2D materials, such as silicene, germanene and stanene, the critical phase transition strain required in monolayer MoS2 can be drastically reduced. Particularly when MoS2 forms sandwiched structures with silicene or stanene, the uniaxial and biaxial critical strain can be reduced to ∼0.06 and ∼0.03, respectively, which is well below the experimental elastic limit. This theoretical study not only proposes an experimental achievable strategy for flexible phase transition design in MoS2 nanostructure, but also identifies those MoS2 heterostructures as 2D candidates for potential shape memory devices and pseudoelasticity applications.

Graphical abstract: MoS2 heterostructure with tunable phase stability: strain induced interlayer covalent bond formation

Supplementary files

Article information

Article type
Communication
Submitted
23 Mar 2017
Accepted
26 May 2017
First published
27 May 2017

Nanoscale, 2017,9, 8126-8132

MoS2 heterostructure with tunable phase stability: strain induced interlayer covalent bond formation

B. Ouyang, S. Xiong, Z. Yang, Y. Jing and Y. Wang, Nanoscale, 2017, 9, 8126 DOI: 10.1039/C7NR02070H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements