Issue 33, 2017

An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

Abstract

The fabrication of large-area and well-ordered nanostructures using lithographic techniques is challenging. We have developed novel approaches for sub-50 nm nanopatterning using an electrohydrodynamic lithography (EHL) technique by tailoring experimental parameters such as applied voltage, stamp features, filling ratio, and choice of resist film. We obtain a sub-50 nm pattern replica from a master stamp that contains an array of line patterns having 50 nm widths. Moreover, we show that a far-smaller pattern replication than the original pattern size can be readily obtained by carefully adjusting the experimental conditions. Perfect- and much smaller-pattern replicas have been realized from the master stamp with an array of hole patterns having a 400 nm hole size by tuning the filling ratio. We also demonstrate that an array of 30 nm graphene nanoribbons can be easily fabricated by exploring a hierarchical core–shell template structure employing a bilayer resist film via an EHL technique. The proposed minimal-contact patterning method is simple, versatile, and inexpensive and has potential to become a powerful technique for realizing feasible ultrafine nanostructures on a wafer scale.

Graphical abstract: An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

Supplementary files

Article information

Article type
Paper
Submitted
01 Feb 2017
Accepted
29 May 2017
First published
31 May 2017

Nanoscale, 2017,9, 11881-11887

An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

S. Lee, S. Jung, A. Jang, J. Hwang, H. S. Shin, J. Lee and D. J. Kang, Nanoscale, 2017, 9, 11881 DOI: 10.1039/C7NR00749C

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