Correction: Direct synthesis of large-scale hierarchical MoS2 films nanostructured with orthogonally oriented vertically and horizontally aligned layers

Xiaoyan Zhang; Saifeng Zhang; Bohua Chen; Hao Wang; Kan Wu; Yang Chen; Jintai Fan; Shen Qi; Xiaoli Cui; Long Zhang; Jun Wang

doi:10.1039/C5NR90233A

Correction: Direct synthesis of large-scale hierarchical MoS₂ films nanostructured with orthogonally oriented vertically and horizontally aligned layers

Xiaoyan Zhang,^a Saifeng Zhang,^a Bohua Chen,^b Hao Wang,^b Kan Wu,^b Yang Chen,^c Jintai Fan,^a Shen Qi,^a Xiaoli Cui,^c Long Zhang^a and Jun Wang*^ad

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* Corresponding authors

^a Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China
E-mail: jwang@siom.ac.cn

^b State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China

^c Department of Materials Science, Fudan University, Shanghai 200433, China

^d State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

Abstract

Correction for ‘Direct synthesis of large-scale hierarchical MoS₂ films nanostructured with orthogonally oriented vertically and horizontally aligned layers’ by Xiaoyan Zhang et al., Nanoscale, 2016, DOI: 10.1039/c5nr05938k.

Nanoscale

Correction: Direct synthesis of large-scale hierarchical MoS₂ films nanostructured with orthogonally oriented vertically and horizontally aligned layers

Abstract

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Correction: Direct synthesis of large-scale hierarchical MoS₂ films nanostructured with orthogonally oriented vertically and horizontally aligned layers

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