Issue 8, 2016

Ultrasensitive terahertz modulation by silicon-grown MoS2 nanosheets

Abstract

Two-dimensional (2D) materials play more and more important roles these days, due to their broad applications in many areas. Herein, we propose an optically-pumped terahertz (THz) modulator, based on Si-grown MoS2 nanosheets. The broadband modulation effect has been proved by THz time domain spectroscopy and numerical simulation. The modulation depth of this Si-grown MoS2 nanosheet can reach over 75% under the low pumping power of 0.24 W cm−2, much deeper than that of bare silicon. By theoretical models and simulation, it is proved that the broadband modulation effect can be described as a free carrier absorption for THz waves in the Drude form. Importantly, by a catalyst mechanism in the Si-grown MoS2, it is concluded that the MoS2–Si heterostructure enables the MoS2 to catalyze more carriers generated on the Si surface. This novel 2D material has a high effective modulation on THz waves under a low pumping power density, which affords it a promising potential in THz applications.

Graphical abstract: Ultrasensitive terahertz modulation by silicon-grown MoS2 nanosheets

Article information

Article type
Paper
Submitted
16 Nov 2015
Accepted
27 Jan 2016
First published
28 Jan 2016

Nanoscale, 2016,8, 4713-4719

Ultrasensitive terahertz modulation by silicon-grown MoS2 nanosheets

S. Chen, F. Fan, Y. Miao, X. He, K. Zhang and S. Chang, Nanoscale, 2016, 8, 4713 DOI: 10.1039/C5NR08101G

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