Issue 11, 2013

From atoms to layers: in situ gold cluster growth kinetics during sputter deposition

Abstract

The adjustment of size-dependent catalytic, electrical and optical properties of gold cluster assemblies is a very significant issue in modern applied nanotechnology. We present a real-time investigation of the growth kinetics of gold nanostructures from small nuclei to a complete gold layer during magnetron sputter deposition with high time resolution by means of in situ microbeam grazing incidence small-angle X-ray scattering (μGISAXS). We specify the four-stage growth including their thresholds with sub-monolayer resolution and identify phase transitions monitored in Yoneda intensity as a material-specific characteristic. An innovative and flexible geometrical model enables the extraction of morphological real space parameters, such as cluster size and shape, correlation distance, layer porosity and surface coverage, directly from reciprocal space scattering data. This approach enables a large variety of future investigations of the influence of different process parameters on the thin metal film morphology. Furthermore, our study allows for deducing the wetting behavior of gold cluster films on solid substrates and provides a better understanding of the growth kinetics in general, which is essential for optimization of manufacturing parameters, saving energy and resources.

Graphical abstract: From atoms to layers: in situ gold cluster growth kinetics during sputter deposition

Supplementary files

Article information

Article type
Paper
Submitted
20 Dec 2012
Accepted
30 Mar 2013
First published
08 Apr 2013

Nanoscale, 2013,5, 5053-5062

From atoms to layers: in situ gold cluster growth kinetics during sputter deposition

M. Schwartzkopf, A. Buffet, V. Körstgens, E. Metwalli, K. Schlage, G. Benecke, J. Perlich, M. Rawolle, A. Rothkirch, B. Heidmann, G. Herzog, P. Müller-Buschbaum, R. Röhlsberger, R. Gehrke, N. Stribeck and S. V. Roth, Nanoscale, 2013, 5, 5053 DOI: 10.1039/C3NR34216F

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