Issue 20, 2013

Nanoscale quantification of charge injection and transportation process in Si-nanocrystal based sandwiched structure

Abstract

Si nanocrystals are formed by using KrF pulsed laser crystallization of an amorphous SiC/ultrathin amorphous Si/amorphous SiC sandwiched structure. Electrons and holes are injected into Si nanocrystals via a biased conductive AFM tip and the carrier decay and transportation behaviours at the nanoscale are studied by joint characterization techniques of Kelvin probe force microscopy (KPFM) and conductive atomic force microscopy (CAFM). Quantification of the surface charge density is realized by solving the Poisson equation based on KPFM measurements. Besides, the asymmetric barrier height for electrons and holes is considered to play a dominant role in controlling the charge retention and transportation characteristics. The methodology developed in this work is promising for studying the charge injection and transportation process in other materials and structures at the nanoscale.

Graphical abstract: Nanoscale quantification of charge injection and transportation process in Si-nanocrystal based sandwiched structure

Article information

Article type
Paper
Submitted
27 Jun 2013
Accepted
07 Aug 2013
First published
08 Aug 2013

Nanoscale, 2013,5, 9971-9977

Nanoscale quantification of charge injection and transportation process in Si-nanocrystal based sandwiched structure

J. Xu, J. Xu, P. Zhang, W. Li and K. Chen, Nanoscale, 2013, 5, 9971 DOI: 10.1039/C3NR03306F

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