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A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology


A DLVO model for catalyst motion in metal-assisted chemical etching based upon controlled out-of-plane rotational etching and force-displacement measurements

Corresponding authors
School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, USA
Department of Mechanical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, USA
Woodruff School of Mechanical Engineering and Petit Institute for Bioengineering and Bioscience, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, USA
Department of Electronics Engineering, The Chinese University of Hong Kong Shitan, Hong Kong, China
Nanoscale, 2013,5, 961-970

DOI: 10.1039/C2NR32293E
Received 22 Jun 2012, Accepted 28 Nov 2012
First published online 04 Dec 2012
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