Publishing: Journals, books and databases
Close Icon
 
Scheduled maintenance upgrade on Saturday 2nd of July 2016 from 11.30am to 3.00pm (BST)
During this time our websites will be offline temporarily. If you have any questions please use the feedback button on this page. We apologise for any inconvenience this might cause and thank you for your patience.
A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology
Impact Factor 7.76 48 Issues per Year
Paper

A DLVO model for catalyst motion in metal-assisted chemical etching based upon controlled out-of-plane rotational etching and force-displacement measurements

*
Corresponding authors
a
School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, USA
E-mail: ohildreth@gatech.edu, owen.hildreth@nist.gov
b
Department of Mechanical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, USA
E-mail: konradr@mit.edu
c
Woodruff School of Mechanical Engineering and Petit Institute for Bioengineering and Bioscience, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, USA
E-mail: agf@gatech.edu
d
Department of Electronics Engineering, The Chinese University of Hong Kong Shitan, Hong Kong, China
E-mail: cp.wong@mse.gatech.edu
Nanoscale, 2013,5, 961-970

DOI: 10.1039/C2NR32293E
Received 22 Jun 2012, Accepted 28 Nov 2012
First published online 04 Dec 2012
| | | | | | More
Please wait while Download options loads
 
 

Supplementary Info