Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning
Abstract
Lithographic alternatives to conventional layer-by-layer processes for the design of 3D structures such as photonic or phononic crystals often present a dichotomy: patterning control versuspatterning area. We demonstrate a combined technique of large area
- This article is part of the themed collection: Lithography