Issue 3, 2014

Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

Abstract

Recently, a new approach to atomic layer deposition (ALD) has been developed that doesn't require vacuum and is much faster than conventional ALD. This is achieved by separating the precursors in space rather than in time. This approach is most commonly called Spatial ALD (SALD). In our lab we have been using/developing a novel atmospheric SALD system to fabricate active components for new generation solar cells, showing the potential of this novel technique for the fabrication of high quality materials that can be integrated into devices. In this minireview we will introduce the basics of SALD and illustrate its great potential by highlighting recent results in the field of photovoltaics.

Graphical abstract: Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

Article information

Article type
Minireview
Submitted
18 Nov 2013
Accepted
06 Feb 2014
First published
06 Feb 2014
This article is Open Access
Creative Commons BY license

Mater. Horiz., 2014,1, 314-320

Author version available

Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

D. Muñoz-Rojas and J. MacManus-Driscoll, Mater. Horiz., 2014, 1, 314 DOI: 10.1039/C3MH00136A

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements