Jump to main content
Jump to site search

Issue 21, 2016
Previous Article Next Article

Caulking polydimethylsiloxane molecular networks by thermal chemical vapor deposition of Parylene-C

Author affiliations

Abstract

Surface functionalization of polydimethylsiloxane (PDMS) is important in developing high-performance microfluidic devices. This work applied the thermal chemical vapor deposition (t-CVD) of Parylene-C onto PDMS to caulk the molecular network while retaining the original surface properties for the oxygen plasma bonding. The very low deposition rates (for example, a nominal rate of 0.12 Å min−1 at 135 °C) of Parylene-C at elevated substrate temperatures enabled the reactive Parylene-C monomers to penetrate into the PDMS matrix up to 4.6 ± 0.1 μm (135 °C), which was verified for the first time by a scanning electron microscope with an energy dispersive X-ray analysis (SEM-EDAX). The Parylene-C caulked in the molecular network of PDMS matrix guaranteed an excellent resistance to small molecule permeations. Meanwhile, only discrete nucleation islands were formed on the top surface rather than a continuous Parylene-C layer as observed under the AFM scan, which made the processed PDMS surface ready for device assembly. This surface functionalization method has better long-term stability than the other wet-type rivals. The barrier for oxygen plasma bonding in previously reported dry surface treatments was also avoided, thereby, facilitating the device assembly. The present work successfully developed a novel pcPDMS (Parylene-C caulked PDMS) technique, which overcame the bonding difficulty in the previous works but retained the low small molecule permeability as before. Caulking a molecular network through the t-CVD of Parylene-C also demonstrated a new strategy of functionalizing polymer surfaces and preparing new hybrid materials for wide lab-on-a-chip applications.

Graphical abstract: Caulking polydimethylsiloxane molecular networks by thermal chemical vapor deposition of Parylene-C

Back to tab navigation
Please wait while Download options loads

Publication details

The article was received on 28 Aug 2016, accepted on 28 Sep 2016 and first published on 28 Sep 2016


Article type: Paper
DOI: 10.1039/C6LC01086E
Citation: Lab Chip, 2016,16, 4220-4229
  •   Request permissions

    Caulking polydimethylsiloxane molecular networks by thermal chemical vapor deposition of Parylene-C

    Y. Liu, L. Zhang, C. Mo, Y. Cao, W. Wu and W. Wang, Lab Chip, 2016, 16, 4220
    DOI: 10.1039/C6LC01086E

Search articles by author