Issue 14, 2010

Patterning microfluidic device wettability using flow confinement

Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

Graphical abstract: Patterning microfluidic device wettability using flow confinement

Supplementary files

Article information

Article type
Communication
Submitted
10 Mar 2010
Accepted
05 May 2010
First published
21 May 2010

Lab Chip, 2010,10, 1774-1776

Patterning microfluidic device wettability using flow confinement

A. R. Abate, J. Thiele, M. Weinhart and D. A. Weitz, Lab Chip, 2010, 10, 1774 DOI: 10.1039/C004124F

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