Issue 14, 2009
From the journal:

Lab on a Chip

Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio†

Xuan Mu,ab   Qionglin Liang,*b   Ping Hu,c   Kangning Ren,‡b   Yiming Wangb  and  Guoan Luo*ab  

* Corresponding authors

a School of Pharmacy, East China University of Science and Technology, Shanghai, P. R. China
E-mail: Luoga@tsinghua.edu.cn, Liangql@tsinghua.edu.cn

b Key Laboratory of Bioorganic Phosphorus Chemistry & Chemical Biology (Ministry of Education), Department of Chemistry, Tsinghua University, Beijing, P. R. China

c College of Chemical and Molecular Engineering, East China University of Science and Technology, Shanghai, P. R. China

Abstract

A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as “liquid etch mask”. Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.

Graphical abstract: Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

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Article information

DOI
https://doi.org/10.1039/B904769G
Article type
Communication
Submitted
09 Mar 2009
Accepted
18 May 2009
First published
26 May 2009

Lab Chip, 2009,9, 1994-1996

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Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

X. Mu, Q. Liang, P. Hu, K. Ren, Y. Wang and G. Luo, Lab Chip, 2009, 9, 1994 DOI: 10.1039/B904769G

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