Issue 7, 2009

Lock release lithography for 3D and composite microparticles

Abstract

We present a method called “Lock Release Lithography (LRL)” that utilizes a combination of channel topography, mask design, and pressure-induced channel deformation to form and release particles in a cycled fashion. This technique provides a means for the high-throughput production of particles with complex 3D morphologies and composite particles with spatially configurable chemistries. In this work, we demonstrate a diverse set of functional particles including those displaying heterogeneous swelling characteristics and containing functional entities such as nucleic acids, proteins and beads.

Graphical abstract: Lock release lithography for 3D and composite microparticles

Supplementary files

Article information

Article type
Communication
Submitted
08 Dec 2008
Accepted
04 Feb 2009
First published
13 Feb 2009

Lab Chip, 2009,9, 863-866

Lock release lithography for 3D and composite microparticles

K. W. Bong, D. C. Pregibon and P. S. Doyle, Lab Chip, 2009, 9, 863 DOI: 10.1039/B821930C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements