A facile in situ hydrophobic layer protected selective etching strategy for the synchronous synthesis/modification of hollow or rattle-type silica nanoconstructs†
Abstract
A novel and general in situ hydrophobic shell-protected selective
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* Corresponding authors
a
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, No.1295 Ding-xi Road, Shanghai, P. R. China
E-mail:
hrchen@mail.sic.ac.cn, jlshi@sunm.shcnc.ac.cn
Fax: +86 21-5241-3122
b Second Affiliated Hospital of Chongqing Medical University, No.6 Lin-jiang Road, Chongqing, P. R. China
c
State Key Laboratory of Ultrasound Engineering in Medicine, Chongqing Key Laboratory of Ultrasound in Medicine and Engineering, College of Biomedical Engineering, Chongqing Medical University, Chongqing 400016, P.R. China
E-mail:
zengdp@haifu.com.cn
A novel and general in situ hydrophobic shell-protected selective
K. Zhang, H. Chen, Y. Zheng, Y. Chen, M. Ma, X. Wang, L. Wang, D. Zeng and J. Shi, J. Mater. Chem., 2012, 22, 12553 DOI: 10.1039/C2JM31504A
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