Issue 7, 2012

A trifunctional photopatterning component derived from cysteine: fabrication of a deposited silver micropattern

Abstract

A thin film of N-(9-fluorenylmethylcarboxy)cysteine-derived oligosiloxane was prepared and subjected to photobase-induced patterning from the polycondensation of siloxanes. The photopatterned film was then treated with a silver ammine complex to deposit successfully a silver species. X-Ray photoelectron spectroscopy (XPS) measurements of the deposited silver film indicated the presence of disulfide and atomic silver inside the film, whereas the silver on the surface of the film was in an oxidized state. Quartz crystal microbalance and XPS measurements showed that the amino groups and amide moieties may contribute to the interaction towards the silver species. The deposited silver layer exhibited a resistivity of 2 × 10−1 mΩ cm.

Graphical abstract: A trifunctional photopatterning component derived from cysteine: fabrication of a deposited silver micropattern

Supplementary files

Article information

Article type
Paper
Submitted
20 Jul 2011
Accepted
09 Dec 2011
First published
06 Jan 2012

J. Mater. Chem., 2012,22, 3139-3147

A trifunctional photopatterning component derived from cysteine: fabrication of a deposited silver micropattern

M. Furutani and K. Kudo, J. Mater. Chem., 2012, 22, 3139 DOI: 10.1039/C2JM13448A

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