Issue 48, 2011

Vapor treatment of nanocrystalline WO3 photoanodes for enhanced photoelectrochemical performance in the decomposition of water

Abstract

WO3 mesoporous films were prepared using a sol–gel method to serve as the photoanode for water cleavage in a 1 M HClO4 solution with Pt as the counter electrode. Post-treatment of the as-synthesized WO3 film with methanol and ethanol vapors, especially with methanol, improves the photocurrent during photoelectrolysis of water. Water and hexane vapors have a deleterious influence on the WO3 film. Scanning electron microscopy and X-ray diffraction analyses showed that treatment with methanol vapors did not alter the configuration of the nanocrystalline framework or the WO3 mesoscopic structure. Optical absorption and W L3-edge X-ray absorption near-edge structural analyses also revealed that the W-ion electronic and oxidation states remained unchanged after methanol treatment. However, extended X-ray absorption fine structure analysis of the W L3-edge showed that the coordination number of W6+ sites in the WO3 film significantly increased with the methanol treatment, indicating a corresponding decrease in the defect-state density of the film. The observed increase in the coordination number resulted in a 25% increase in the electron transit rate of the WO3 film and enhanced solar energy conversion by 32% for the photoelectrolysis of water. We conclude that post-treatment with methanol vapor remedies the defect region in nanocrystalline WO3 films, and improves the film's electron transport performance in a photoelectrochemical cell.

Graphical abstract: Vapor treatment of nanocrystalline WO3 photoanodes for enhanced photoelectrochemical performance in the decomposition of water

Supplementary files

Article information

Article type
Paper
Submitted
26 Sep 2011
Accepted
29 Sep 2011
First published
01 Nov 2011

J. Mater. Chem., 2011,21, 19402-19409

Vapor treatment of nanocrystalline WO3 photoanodes for enhanced photoelectrochemical performance in the decomposition of water

P. Hsiao, L. Chen, T. Li and H. Teng, J. Mater. Chem., 2011, 21, 19402 DOI: 10.1039/C1JM14785D

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