Issue 42, 2011

Large 2D self-assembled domains of cobalt nanoparticles onto silicon wafers

Abstract

We report on self-assembly processes of cobalt nanoparticles onto silicon wafers by using drop casting and spin coating techniques. It has been found that self-assembled patterns markedly depend on the substrate temperature. These changes in behaviour are explained in terms of evaporation time, thermal energy, and van der Waals interactions. We demonstrate here that under suitable conditions of temperature and colloid volume, monolayers of magnetic nanoparticles can be simply formed with long range ordered nanoparticles on monolayers of several microns area onto the used substrate.

Graphical abstract: Large 2D self-assembled domains of cobalt nanoparticles onto silicon wafers

Supplementary files

Article information

Article type
Paper
Submitted
17 Apr 2011
Accepted
15 Jul 2011
First published
22 Aug 2011

J. Mater. Chem., 2011,21, 16973-16977

Large 2D self-assembled domains of cobalt nanoparticles onto silicon wafers

L. Peña, M. Varón, Z. Konstantinovic, L. Balcells, B. Martínez and V. Puntes, J. Mater. Chem., 2011, 21, 16973 DOI: 10.1039/C1JM11647A

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