Dip-pen nanolithography of nanostructured oligofluorene truxenes in a photo-curable host matrix

Abstract

We report the controlled patterning of nano-sized oligofluorene truxenes onto silicon dioxide by dip-pen nanolithography (DPN) using a UV-curable pre-polymer as a carrier fluid. In this technique, a sharp atomic force microscope (AFM) cantilever tip is used to transfer the liquid ink onto a surface using piezo-controlled movements and excellent spatial registry. The photo-curable carrier fluid is then exposed to UV-light to produce a cross-linked, host matrix while retaining the photoluminescent properties of the truxenes and providing protection against photo-oxidation. The chemical composition of the composite structures deposited by DPN was characterised by Raman microspectroscopy and microphotoluminescence to demonstrate successful incorporation of the photoluminescent truxenes in the polymer matrix.