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Issue 43, 2010
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Easy patterning of silver nanoparticle superstructures on silicon surfaces

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Abstract

Through selective reduction of metal-amino acid complex precursors on patterned silicon substrates designed by e-beam lithography (EBL) and reacting ion-beam etching (RIE), Ag nanoparticle (NP) superstructures with controlled sizes, morphologies, and positions are successfully prepared with good reproducibility, and show remarkably high and reproducible surface enhanced Raman scattering (SERS) enhancement.

Graphical abstract: Easy patterning of silver nanoparticle superstructures on silicon surfaces

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Publication details

The article was received on 06 Jul 2010, accepted on 22 Aug 2010 and first published on 08 Sep 2010


Article type: Communication
DOI: 10.1039/C0JM02147D
Citation: J. Mater. Chem., 2010,20, 9608-9612
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    Easy patterning of silver nanoparticle superstructures on silicon surfaces

    C. Li, Z. Tang and L. Jiang, J. Mater. Chem., 2010, 20, 9608
    DOI: 10.1039/C0JM02147D

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