Issue 43, 2010

Easy patterning of silver nanoparticle superstructures on silicon surfaces

Abstract

Through selective reduction of metal-amino acid complex precursors on patterned silicon substrates designed by e-beam lithography (EBL) and reacting ion-beam etching (RIE), Ag nanoparticle (NP) superstructures with controlled sizes, morphologies, and positions are successfully prepared with good reproducibility, and show remarkably high and reproducible surface enhanced Raman scattering (SERS) enhancement.

Graphical abstract: Easy patterning of silver nanoparticle superstructures on silicon surfaces

Supplementary files

Article information

Article type
Communication
Submitted
06 Jul 2010
Accepted
22 Aug 2010
First published
08 Sep 2010

J. Mater. Chem., 2010,20, 9608-9612

Easy patterning of silver nanoparticle superstructures on silicon surfaces

C. Li, Z. Tang and L. Jiang, J. Mater. Chem., 2010, 20, 9608 DOI: 10.1039/C0JM02147D

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