High-Tg carbazole derivatives as a new class of aggregation-induced emission enhancement materials

Zhiyong Yang; Zhenguo Chi; Bingjia Xu; Haiyin Li; Xiqi Zhang; Xiaofang Li; Siwei Liu; Yi Zhang; Jiarui Xu

doi:10.1039/C0JM00712A

You do not have JavaScript enabled. Please enable JavaScript to access the full features of the site or access our non-JavaScript page.

High-T_gcarbazole derivatives as a new class of aggregation-induced emission enhancement materials†

Zhiyong Yang,^a Zhenguo Chi,*^a Bingjia Xu,^a Haiyin Li,^a Xiqi Zhang,^a Xiaofang Li,^a Siwei Liu,^a Yi Zhang^a and Jiarui Xu*^a

Author affiliations

* Corresponding authors

^a PCFM Lab and DSAPM Lab, OFCM Institute, State Key Laboratory of Optoelectronic Materials and Technologies, School of Chemistry and Chemical Engineering, Sun Yat-sen University, Guangzhou, China
E-mail: chizhg@mail.sysu.edu.cn, xjr@mail.sysu.edu.cn
Fax: +86 20 84112222
Tel: +86 20 84111081

Abstract

A new class of carbazole derivatives was facilely synthesized by Wittig–Horner and Suzuki reactions, and their thermal and photophysical properties were investigated. They exhibited aggregation-induced emission enhancement (AIEE) characteristics and high thermal stability. The glass transition temperatures (T_g) of these compounds ranged from 178 to 231 °C, while their decomposition temperatures (T_d) ranged from 496 to 535 °C. The solubility of the derivatives did not monotonically change with an increasing number of phenylene bridges, but exhibited a clear odd-even effect.

Download options Please wait...

Supplementary files

Fig. S1–S8 PDF (1272K)

Article information

DOI: https://doi.org/10.1039/C0JM00712A
Article type: Paper
Submitted: 15 Mar 2010
Accepted: 24 May 2010
First published: 03 Aug 2010

Download Citation

J. Mater. Chem., 2010,20, 7352-7359

Permissions

Request permissions

High-T_g carbazole derivatives as a new class of aggregation-induced emission enhancement materials

Z. Yang, Z. Chi, B. Xu, H. Li, X. Zhang, X. Li, S. Liu, Y. Zhang and J. Xu, J. Mater. Chem., 2010, 20, 7352 DOI: 10.1039/C0JM00712A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Fetching data from CrossRef.
This may take some time to load.

Journal of Materials Chemistry