High refractive index and high transparency HfO2 nanocomposites for next generation lithography

Woo Jin Bae; Markos Trikeriotis; Jing Sha; Evan L. Schwartz; Robert Rodriguez; Paul Zimmerman; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1039/C0JM00679C

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High refractive index and high transparency HfO₂ nanocomposites for next generation lithography†

Woo Jin Bae,^a Markos Trikeriotis,^a Jing Sha,^a Evan L. Schwartz,^a Robert Rodriguez,^a Paul Zimmerman,^b Emmanuel P. Giannelis^a and Christopher K. Ober*^a

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* Corresponding authors

^a Department of Materials Science and Engineering, Cornell University, Ithaca, New York, USA
E-mail: cko3@cornell.edu

^b Sematech, 257 Fuller Rd, Albany, NY, USA

Abstract

HfO₂ nanoparticles stabilized with selected ligands possess high refractive index and low absorbance under 193 nm radiation. These materials combined with an appropriate photopolymer were used as a nanocomposite photoresist. The resulting nanocomposite materials were used successfully for high resolution patterning.

$Graphical abstract: High refractive index and high transparency HfO2 nanocomposites for next generation lithography$

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Supplementary files

Full experimental details and characterization PDF (2858K)

Article information

DOI: https://doi.org/10.1039/C0JM00679C
Article type: Communication
Submitted: 12 Mar 2010
Accepted: 27 Apr 2010
First published: 26 May 2010

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J. Mater. Chem., 2010,20, 5186-5189

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High refractive index and high transparency HfO₂ nanocomposites for next generation lithography

W. J. Bae, M. Trikeriotis, J. Sha, E. L. Schwartz, R. Rodriguez, P. Zimmerman, E. P. Giannelis and C. K. Ober, J. Mater. Chem., 2010, 20, 5186 DOI: 10.1039/C0JM00679C

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Journal of Materials Chemistry