Issue 19, 2010

Inkjet-printed Cu source/drain electrodes for solution-deposited thin film transistors

Abstract

We report on the first utility of Cu nanoparticle inks as low-cost, printable electrodes in the fabrication of solution-deposited amorphous oxide semiconductor thin film transistors. The performance of printed Cu electrodes was studied in terms of involvements of surface states in the devices. The surface chemical structures of Cu nanoparticulate electrodes were observed to be modified, dependent on the molecular weight of the polyvinylpyrrolidone capping molecules used in their synthesis. The surface dipoles became weak, and the work function of the printed electrodes decreased with increasing the molecular weight. The work function tailored by introducing the larger capping agents allowed for a better energetic leveling with the metal oxide semiconductor layer, resulting in the improved device performance.

Graphical abstract: Inkjet-printed Cu source/drain electrodes for solution-deposited thin film transistors

Article information

Article type
Paper
Submitted
07 Jan 2010
Accepted
01 Mar 2010
First published
22 Mar 2010

J. Mater. Chem., 2010,20, 3877-3882

Inkjet-printed Cu source/drain electrodes for solution-deposited thin film transistors

K. Woo, C. Bae, Y. Jeong, D. Kim and J. Moon, J. Mater. Chem., 2010, 20, 3877 DOI: 10.1039/C000162G

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