Issue 2, 2006
From the journal:

Journal of Materials Chemistry

Fabrication of suspended single-walled carbon nanotubesvia a direct lithographic route

Byung Seok Oh,a   Yo-Sep Min,bc   Eun Ju Bae,b   Donghun Kang,b   In Sun Jung,b   Cheol Seong Hwang,c   Young Keun Kim*a  and  Wanjun Park*b  

* Corresponding authors

a National Research Laboratory for Information Devices and Materials, Department of Materials Science and Engineering, Korea University, Anam-Dong 5-1, Sungbuk-Ku, Seoul, Korea
E-mail: ykim97@korea.ac.kr
Tel: +82 2 3290 3281

b Materials and Devices Research Center, Samsung Advanced Institute of Technology, Yong-In, Kyeongki-Do, Korea
E-mail: wanjun@samsung.com
Fax: +82 31 280 9308
Tel: +82 31 280 9305

c School of Materials Science and Engineering, Seoul National University, Seoul, Korea

Abstract

We report a fabrication method of suspended SWNTs between SiO2 pillars via a direct lithographic route using a simple mixture of catalyst precursor and conventional electron beam resist. The catalytic electron beam resist (Cat-ER) plays roles as both catalyst and ER for growth and alignment of CNTs, respectively. Since the Cat-ER pattern can be utilized as an etch mask to fabricate the pillar structure, the suspended nanotubes are compatibly obtained with current lithographic processes. The suspended nanotubes are characterized to be single-walled by intensity mapping of a radial breathing mode in two dimensions with resonant Raman spectroscopy.

Graphical abstract: Fabrication of suspended single-walled carbon nanotubes via a direct lithographic route

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Article information

DOI
https://doi.org/10.1039/B510742C
Article type
Paper
Submitted
27 Jul 2005
Accepted
10 Oct 2005
First published
28 Oct 2005

J. Mater. Chem., 2006,16, 174-178

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Fabrication of suspended single-walled carbon nanotubes via a direct lithographic route

B. S. Oh, Y. Min, E. J. Bae, D. Kang, I. S. Jung, C. S. Hwang, Y. K. Kim and W. Park, J. Mater. Chem., 2006, 16, 174 DOI: 10.1039/B510742C

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