The control of thin film deposition and recent developments in oxide film growth

Abstract

This review describes just some of the recent developments in thin film deposition technology which have led to improved understanding and control of film growth. The first part is concerned with the development of sputter deposition methods offering control of the energy of depositing species, and the use of structure zone models, which describe the link between film deposition parameters and film structure. Other deposition techniques are then introduced, including examples of the wide range of chemistry-based techniques currently being developed, to illustrate the fabrication of complex multi-component materials and the application of non-vacuum-based methods. The current level of control which may be achieved through application of some advanced in situ methods for monitoring film growth is also described.