Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry (DC-GD-OES)
Abstract
Major parts of the mechanism of the wet chemical
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* Corresponding authors
a
Leibniz Institute for Solid State and Materials Research Dresden, IFW Dresden e.V., Helmholtzstraße 20, Dresden, Germany
E-mail:
v.hoffmann@ifw-dresden.de
b GLOBALFOUNDRIES Dresden Module One Limited Liability Company & Co, KG Wilschdorfer Landstr. 101, Dresden, Germany
c Hochschule Lausitz—University of Applied Sciences, Department of Biological, Chemical, and Process Engineering, Großenhainer Straße 57, Senftenberg, Germany
Major parts of the mechanism of the wet chemical
V. Hoffmann, M. Steinert and J. Acker, J. Anal. At. Spectrom., 2011, 26, 1990 DOI: 10.1039/C1JA10033E
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