Issue 0, 1970

The kinetics of the reactions of silicon compounds. Part IV. Unimolecular gas-phase thermal decomposition of 2,2-difluoroethyltributoxysilane

Abstract

The gas-phase thermal decomposition of 2,2-difluoroethyltri-n-butoxysilane into vinyl fluoride and tri-n-butoxyfluorosilane shows first-order kinetics at 240–320° and 7–97 torr initial pressure. The reaction is homogeneous and unaffected by the addition of nitric oxide or propene. The first-order rate constant is pressure-independent and given by: log10k(sec.–1)=(10·25 ± 0·26)–(35,055 ± 660)/4·576T.

It is concluded that the reaction is unimolecular and proceeds by a four-centre β-fluorine elimination similar to that found for other β-fluoroalkylsilicon compounds. Spectroscopic properties of tri-n-butoxyfluorosilane are reported.

Article information

Article type
Paper

J. Chem. Soc. B, 1970, 578-580

The kinetics of the reactions of silicon compounds. Part IV. Unimolecular gas-phase thermal decomposition of 2,2-difluoroethyltributoxysilane

R. N. Haszeldine, P. J. Robinson and J. A. Walsh, J. Chem. Soc. B, 1970, 578 DOI: 10.1039/J29700000578

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