Thermochemistry of silicon-containing compounds. Part 1.—Silicon–halogen compounds, an evaluation

Abstract

Literature data on the heats of formation of silicon–halogen compounds have been collected and reviewed. The coverage includes all tetravalent monosilicon compounds containing Si—H—X, where X is a single halogen, as well as the subhalides SiX_n, where n= 1, 2 or 3. The data are critically evaluated from the standpoints of bond additivity and general chemical reactivity of the species involved as well as by detailed consideration of individual studies. Earlier compilations or reviews are discussed. A set of recommended values (with uncertainties) is proposed. For the divalent species, SiX₂, a self-consistent set of lone-pair stabilisation energies is obtained.