Issue 19, 2015

Influence of the interface in quantum corrections on the low-temperature resistance of La2/3Sr1/3MnO3 trilayer masking thin films

Abstract

We report the low-temperature resistance upturn in sandwiched structures of La2/3Sr1/3MnO3/ZrO2/La2/3Sr1/3MnO3 and La2/3Sr1/3MnO3/LaMnO3/La2/3Sr1/3MnO3, while it disappeared when the interlayer was replaced by YBa2Cu3O7. The experimental data have been analyzed qualitatively and quantitatively. The results show that the low temperature resistance upturn is mainly due to the quantum correction effects driven by the weak localization and the electron–electron interaction in such a strongly correlated system, and the contribution of each factor varies with grain boundaries. Moreover, the resistance upturns are suppressed by a local magnetic field. These findings will help to further understand the physical mechanism of low-temperature resistance upturn in colossal magnetoresistance manganites. Furthermore, it is also helpful to reveal the intrinsic transport mechanism at the interfaces of semiconductor/ferromagnetism and antiferromagnetism/ferromagnetism.

Graphical abstract: Influence of the interface in quantum corrections on the low-temperature resistance of La2/3Sr1/3MnO3 trilayer masking thin films

Article information

Article type
Paper
Submitted
10 Feb 2015
Accepted
07 Apr 2015
First published
09 Apr 2015

Phys. Chem. Chem. Phys., 2015,17, 12826-12832

Author version available

Influence of the interface in quantum corrections on the low-temperature resistance of La2/3Sr1/3MnO3 trilayer masking thin films

Y. Jin, X. Cui, W. Han, S. Cao, Y. Gao and J. Zhang, Phys. Chem. Chem. Phys., 2015, 17, 12826 DOI: 10.1039/C5CP00842E

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