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Engineering disorder in precipitation-based nano-scaled metal oxide thin films

Corresponding authors
Department of Materials, ETH Zurich, ETH Zurich Wolfgang-Pauli-Str.10, CH-8093 Zurich, Switzerland
Phys. Chem. Chem. Phys., 2010,12, 11114-11124

DOI: 10.1039/B920971A
Received 07 Oct 2009, Accepted 28 May 2010
First published online 29 Jul 2010
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