Issue 30, 2008

Interpretation of diffusion coefficients in nanostructured materials from random walk numerical simulation

Abstract

We make use of the numerical simulation random walk (RWNS) method to compute the “jump” diffusion coefficient of electrons in nanostructured materials via mean-square displacement. First, a summary of analytical results is given that relates the diffusion coefficient obtained from RWNS to those in the multiple-trapping (MT) and hopping models. Simulations are performed in a three-dimensional lattice of trap sites with energies distributed according to an exponential distribution and with a step-function distribution centered at the Fermi level. It is observed that once the stationary state is reached, the ensemble of particles follow Fermi–Dirac statistics with a well-defined Fermi level. In this stationary situation the diffusion coefficient obeys the theoretical predictions so that RWNS effectively reproduces the MT model. Mobilities can be also computed when an electrical bias is applied and they are observed to comply with the Einstein relation when compared with steady-state diffusion coefficients. The evolution of the system towards the stationary situation is also studied. When the diffusion coefficients are monitored along simulation time a transition from anomalous to trap-limited transport is observed. The nature of this transition is discussed in terms of the evolution of electron distribution and the Fermi level. All these results will facilitate the use of RW simulation and related methods to interpret steady-state as well as transient experimental techniques.

Graphical abstract: Interpretation of diffusion coefficients in nanostructured materials from random walk numerical simulation

Article information

Article type
Paper
Submitted
02 Jan 2008
Accepted
02 Apr 2008
First published
13 Jun 2008

Phys. Chem. Chem. Phys., 2008,10, 4478-4485

Interpretation of diffusion coefficients in nanostructured materials from random walk numerical simulation

J. A. Anta, I. Mora-Seró, T. Dittrich and J. Bisquert, Phys. Chem. Chem. Phys., 2008, 10, 4478 DOI: 10.1039/B719821C

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