Issue 21, 2003
From the journal:

Physical Chemistry Chemical Physics

Surface diffusion behavior of photo-generated active species or holes on TiO2 photocatalysts

Keisuke Kawahara,a   Yoshihisa Ohko,a   Tetsu Tatsuma*b  and  Akira Fujishimaa  

* Corresponding authors

a Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo, 7-3-1, Hongo, Bunkyo-ku, Tokyo, Japan

b Institute of Industrial Science, The University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo, Japan
E-mail: tatsuma@iis.u-tokyo.ac.jp

Abstract

A TiO2 photocatalyst modified with octadecyltriethoxysilane (ODS) was irradiated with UV light through a photomask, and the two-dimensional degradation behavior of ODS was monitored by means of Fourier transform infrared (FTIR) microscopy. Decomposition of ODS in the dark region as well as that in the illuminated region was observed, indicating that ˙OH radicals or holes diffused on the TiO2 surface at least 75 μm. The decomposition in the dark region was accelerated after the ODS in the illuminated region was almost decomposed. Stray light due to diffraction, reflection and scattering was not predominantly responsible for the decomposition in the dark region.

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Article information

DOI
https://doi.org/10.1039/B311230F
Article type
Communication
Submitted
15 Sep 2003
Accepted
29 Sep 2003
First published
06 Oct 2003

Phys. Chem. Chem. Phys., 2003,5, 4764-4766

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Surface diffusion behavior of photo-generated active species or holes on TiO2 photocatalysts

K. Kawahara, Y. Ohko, T. Tatsuma and A. Fujishima, Phys. Chem. Chem. Phys., 2003, 5, 4764 DOI: 10.1039/B311230F

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