Issue 22, 2011
From the journal:

CrystEngComm

Tailoring phase and composition at the nanoscale: atomic layer deposition of Zn–Ti–O thin films†

Laura Borgese,a   Elza Bontempi,a   Laura E. Depero,a   Paolo Colombia  and  Ivano Alessandri*a  

* Corresponding authors

a INSTM and Chemistry for Technologies Laboratory, University of Brescia, Via Branze 38, Brescia, Italy
E-mail: ivano.alessandri@ing.unibs.it
Fax: +39 030 3702448
Tel: +39 030 3715667

Abstract

Different Zn–Ti–O phases were prepared with high reproducibility in the form of very thin films (thickness: 40 nm) by alternating atomic layer deposition cycles of TiO2 and ZnO precursors at 90 °C, followed by annealing at 600 °C. This procedure enables a very fine control of stoichiometry and the achievement of unexpected zinc titanate phases.

Graphical abstract: Tailoring phase and composition at the nanoscale: atomic layer deposition of Zn–Ti–O thin films

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Article information

DOI
https://doi.org/10.1039/C1CE05923H
Article type
Communication
Submitted
19 Jul 2011
Accepted
16 Sep 2011
First published
05 Oct 2011

CrystEngComm, 2011,13, 6621-6624

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Tailoring phase and composition at the nanoscale: atomic layer deposition of Zn–Ti–O thin films

L. Borgese, E. Bontempi, L. E. Depero, P. Colombi and I. Alessandri, CrystEngComm, 2011, 13, 6621 DOI: 10.1039/C1CE05923H

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