Issue 17, 2011

Microstructural analysis and phase transformation of CuInS2 thin films during sulfurization

Abstract

This study reports the preparation of CuInS2 (CIS) thin films on Mo-coated glass substrates using in situ sulfurization of thermally evaporated Cu–In precursor films in a thermal evaporation chamber. The precursor films were thermally evaporated at 1.2 × 10−6 Torr and further sulfurization was carried out at 8 Torr of 10% H2S, balanced by Ar. The precursor Cu–In alloy films consist of three types of layered structures with a fixed total thickness of 800 nm. Different temperature–time profiles were used during the sulfurization processes. Various phases in the films were identified using both X-ray diffractometry (XRD) and Raman spectroscopy, the latter of which reveals additional structural information that cannot be observed in the XRD spectra. Direct evidence showing the growth of CIS phase from an Cu11In9 phase is shown by TEM images. Although there are minor differences during the growth of these samples that lead to slightly different growth paths, the growth can be described by a general reaction sequence.

Graphical abstract: Microstructural analysis and phase transformation of CuInS2 thin films during sulfurization

Supplementary files

Article information

Article type
Paper
Submitted
03 Mar 2011
Accepted
02 Jun 2011
First published
08 Jul 2011

CrystEngComm, 2011,13, 5447-5454

Microstructural analysis and phase transformation of CuInS2 thin films during sulfurization

C. Tsai, J. Ting and W. Ho, CrystEngComm, 2011, 13, 5447 DOI: 10.1039/C1CE05276D

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