Jump to main content
Jump to site search

Issue 6, 2016
Previous Article Next Article

Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

Author affiliations

Abstract

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(II)terephthalate metal–organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.

Graphical abstract: Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

Back to tab navigation

Publication details

The article was received on 14 Oct 2015, accepted on 17 Nov 2015 and first published on 18 Nov 2015


Article type: Communication
DOI: 10.1039/C5CC08538A
Author version available: Download Author version (PDF)
Citation: Chem. Commun., 2016,52, 1139-1142
  •   Request permissions

    Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

    E. Ahvenniemi and M. Karppinen, Chem. Commun., 2016, 52, 1139
    DOI: 10.1039/C5CC08538A

Search articles by author

Spotlight

Advertisements