Transparent p-type epitaxial thin films of nickel oxide

Pengfei Zhai; Qinghua Yi; Jie Jian; Haiyan Wang; Pingyuan Song; Chao Dong; Xin Lu; Yinghui Sun; Jie Zhao; Xiao Dai; Yanhui Lou; Hao Yang; Guifu Zou

doi:10.1039/C3CC48877B

Transparent p-type epitaxial thin films of nickel oxide†

Pengfei Zhai,^a Qinghua Yi,^a Jie Jian,^b Haiyan Wang,^b Pingyuan Song,^a Chao Dong,^c Xin Lu,^a Yinghui Sun,^a Jie Zhao,^a Xiao Dai,^a Yanhui Lou,^a Hao Yang^a and Guifu Zou*^a

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* Corresponding authors

^a School of Energy and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215000, P.R. China
E-mail: zouguifu@suda.edu.cn

^b Department of Electrical and Computer Engineering, Texas A & M University, College Station, TX 77843, USA

^c Department of Chemistry and Chemical Biology, The University of New Mexico, Albuquerque, NM 87131, USA

Abstract

Transparent p-type nickel oxide (NiO) thin films have been epitaxially grown on (0001) Al₂O₃ substrates by a chemical solution method of polymer-assisted deposition for the first time. The films have a high optical transparency of above 95% in the wavelength range of 350–900 nm.

Chemical Communications

Transparent p-type epitaxial thin films of nickel oxide†

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Transparent p-type epitaxial thin films of nickel oxide

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