In situ growth of NiCo2S4 nanosheets on graphene for high-performance supercapacitors

Shengjie Peng; Linlin Li; Chengchao Li; Huiteng Tan; Ren Cai; Hong Yu; Subodh Mhaisalkar; Madhavi Srinivasan; Seeram Ramakrishna; Qingyu Yan

doi:10.1039/C3CC46034G

In situ growth of NiCo₂S₄ nanosheets on graphene for high-performance supercapacitors†

Shengjie Peng,*^a Linlin Li,^ab Chengchao Li,^a Huiteng Tan,^ab Ren Cai,^a Hong Yu,^ab Subodh Mhaisalkar,^a Madhavi Srinivasan,^ab Seeram Ramakrishna*^c and Qingyu Yan*^ab

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* Corresponding authors

^a School of Materials Science and Engineering, Nanyang Technological University, Singapore
E-mail: sjpeng@ntu.edu.sg, alexyan@ntu.edu.sg

^b TUM-CREATE Center for Electromobility, Nanyang Technological University, 62 Nanyang Drive, Singapore

^c Center for Nanofibers & Nanotechnology, NUS Nanoscience and Nanotechnology Initiative, Singapore
E-mail: seeram@nus.edu.sg

Abstract

We demonstrate a facile hydrothermal method for growth of ultrathin NiCo₂S₄ nanosheets on reduced graphene oxide (RGO), which exhibit remarkable electrochemical performance with higher capacitance and longer cycle life than the bare NiCo₂S₄ hollow spheres (HSs).

Chemical Communications

In situ growth of NiCo₂S₄ nanosheets on graphene for high-performance supercapacitors†

Abstract

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In situ growth of NiCo₂S₄ nanosheets on graphene for high-performance supercapacitors

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Chemical Communications