Issue 46, 2009
From the journal:

Chemical Communications

Ultra-thin microporous–mesoporous metal oxide films prepared by molecular layer deposition (MLD)†

Xinhua Liang,a   Miao Yu,a   Jianhua Li,a   Ying-Bing Jiangb  and  Alan W. Weimer*a  

* Corresponding authors

a Department of Chemical and Biological Engineering, University of Colorado, Boulder, USA
E-mail: Alan.Weimer@colorado.edu
Fax: +1 3034924341
Tel: +1 3034923759

b Department of Chemical and Nuclear Engineering, University of New Mexico, Albuquerque, USA

Abstract

Porous aluminium oxide films with precisely controlled thickness down to several angstroms are deposited on particle surfaces from dense aluminium alkoxide hybrid polymer films by molecular layer deposition. Porous structures are obtained by either mild water etching at room temperature or calcination in air at elevated temperatures.

Graphical abstract: Ultra-thin microporous–mesoporous metal oxide films prepared by molecular layer deposition (MLD)

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Article information

DOI
https://doi.org/10.1039/B911888H
Article type
Communication
Submitted
17 Jun 2009
Accepted
28 Sep 2009
First published
15 Oct 2009

Chem. Commun., 2009, 7140-7142

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Ultra-thin microporous–mesoporous metal oxide films prepared by molecular layer deposition (MLD)

X. Liang, M. Yu, J. Li, Y. Jiang and A. W. Weimer, Chem. Commun., 2009, 7140 DOI: 10.1039/B911888H

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